The 2D + 3D CAD Pattern Making Course at Delhi Institute of Pattern Masters (DIPM) is designed to meet the growing demand of the modern garment and apparel industry, where digital pattern making and virtual garment simulation have become essential skills.
This course focuses on creating, editing, grading, and visualizing garment patterns using industry-standard CAD software such as Optitex or TUKAcad. Students learn how to convert design concepts into accurate digital patterns and perform 3D garment simulation and digital fitting before physical production.
The training approach at Delhi Institute of Pattern Masters (DIPM) is completely practical and industry-oriented. Learners work directly on CAD systems, gaining real-world experience used in export houses, garment factories, and fashion studios.
This course is suitable for beginners, fashion students, manual pattern makers, boutique owners, and working professionals who want to upgrade their skills and build a strong career in digital pattern making.
Classes are conducted through regular in-person sessions at Delhi Institute of Pattern Masters (DIPM) training centers in Noida and New Delhi. The teaching style is simple, structured, and beginner-friendly, ensuring smooth learning even for non-technical students.
Key Topics Covered
- Introduction to Optitex / TUKAcad interface
- 2D digital pattern drafting
- Pattern editing and modification
- Digital pattern grading for multiple sizes
- Marker making for fabric optimization
- Fabric utilization and costing basics
- 3D garment simulation and visualization
- Digital fitting and fit correction techniques
What You Will Learn
- Create accurate 2D digital garment patterns
- Perform professional pattern grading using CAD software
- Generate efficient markers to reduce fabric wastage
- Simulate garments in 3D for virtual fitting
- Identify and correct fitting issues digitally
- Follow industry-standard CAD workflows
- Gain skills required to work in export houses and garment units
Who Is This Course For
- Beginners interested in CAD pattern making
- Fashion design students
- Manual pattern makers upgrading to CAD
- Apparel industry professionals
- Export house and garment factory aspirants
- Individuals planning a career in digital pattern making
Course Features
- Hands-on training on Optitex / TUKAcad
- 100% practical, software-based learning
- Industry-oriented CAD workflow
- Small batch sizes for personalized guidance
- Live pattern creation and 3D simulation
- Job-ready digital pattern making skills
Frequently Asked Questions (FAQs)
This course at Delhi Institute of Pattern Masters (DIPM) is suitable for beginners, fashion students, manual pattern makers, boutique owners, and apparel professionals. No prior CAD experience is required.
No. DIPM starts training from the basics, making the course suitable even for complete beginners.
Students are trained on Optitex or TUKAcad, depending on batch availability and industry requirements.
The course is 100% practical. Students work directly on CAD software for pattern creation, grading, marker making, and 3D simulation.
Yes. Delhi Institute of Pattern Masters (DIPM) provides complete training in 3D garment simulation and digital fitting techniques.
Classes are conducted offline at Delhi Institute of Pattern Masters (DIPM) training centers.
Branch 1 (Noida):
Plot No-33, SBI Bank, Mamura, Sector-66, Noida, UP – 201301
Near Sector-59 Metro Station
📞 +91-9599118855
Branch 2 (New Delhi):
Indira Nursery, Badarpur Border, New Delhi – 110044
Near Badarpur Metro Station
📞 +91-9311776600
The course duration is 6 months. Classes are held twice a week, each session lasting 2 hours. Batch timings are flexible.
Yes. Marker making and fabric optimization are key parts of the curriculum at Delhi Institute of Pattern Masters (DIPM).
Yes. CAD pattern making skills taught at Delhi Institute of Pattern Masters (DIPM) are highly demanded in garment factories and export houses.
📧 Email: admin@dipmnoida.com
📞 Phone: +91-9599118855 / +91-9311776600
Our admission team will assist you with batch details, fees, and enrollment.
